Step Height Measurement for Thin Film or Coating Thickness

Metallization Films on Silicon Wafers

Anderson Materials Evaluation, Inc. sputter deposited a metal film on a silicon wafer with a mask in place.  When the mask was removed, the step-height of the edge of the metal film is the thickness of the film.  Two of the edge areas analyzed are shown below.

Example 1:  The step height is 2.5 µm, so the film thickness is 2.5 µm.

Example 2:  The step height in another area was also found to be 2.5µm.

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