Metallization Films on Silicon Wafers
Anderson Materials Evaluation, Inc. sputter deposited a metal film on a silicon wafer with a mask in place. When the mask was removed, the step-height of the edge of the metal film is the thickness of the film. Two of the edge areas analyzed are shown below.
Example 1: The step height is 2.5 µm, so the film thickness is 2.5 µm.
Example 2: The step height in another area was also found to be 2.5µm.